Mask-Layout Synthesis Through an Evolutionary Algorithm

An automatic method for synthesizing MEMS mask-layouts is presented. This method uses evolutionary algorithm techniques to optimize the mask-layouts for a forward simulation of fabrication. Initially, a random population of masklayouts is generated. The fabrication of each layout is simulated through a digital process simulator to produce a 3D fabricated shape, which is compared to a user-specified desired shape. Each evolutionary loop governs the stochastic searching behavior such that the mask-layouts whose simulated shapes are closer to the desired shape are more likely to survive. More importantly, the “better” masks are more likely to be evolved among those survived mask-layouts for the next loop. Through such evolutionary iterations, a near global “optimum” mask-layout is likely to be found. A test loop is constructed for the bulk wet etching mask synthesis by incorporating a 3D wet etching simulator. The current emerging results demonstrate the feasibility of this approach to mask-layout synthesis.